Preparation of patterned media with electron beam direct-writing lithography and electrodeposition

被引：0
|
作者：
Chao, Shuzhe [1 ]
Ding, Yucheng [1 ]
Ye, Xiangdong [1 ]
Li, Dichen [1 ]
机构：
[1] State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an 710049, China
来源：
Hsi-An Chiao Tung Ta Hsueh/Journal of Xi'an Jiaotong University | 2009年 / 43卷 / 03期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：27 / 30
相关论文
共 50 条
  • [1] MICROWAVE SAW RESONATORS FABRICATED WITH DIRECT-WRITING ELECTRON-BEAM LITHOGRAPHY
    CROSS, P
    RISSMAN, P
    SHREVE, W
    IEEE TRANSACTIONS ON SONICS AND ULTRASONICS, 1981, 28 (05): : 364 - 364
  • [2] DEVELOPMENT OF POSITIVE ELECTRON-BEAM RESIST FOR 50 KV ELECTRON-BEAM DIRECT-WRITING LITHOGRAPHY
    SAKAMIZU, T
    YAMAGUCHI, H
    SHIRAISHI, H
    MURAI, F
    UENO, T
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2812 - 2817
  • [3] Proximity correction for fabricating a chirped diffraction grating by direct-writing electron-beam lithography
    Okano, M
    Kikuta, H
    Hirai, Y
    Yamamoto, K
    Yotsuya, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (9A): : 5602 - 5606
  • [4] SUCCESSIVE DEVELOPMENT OPTIMIZATION OF RESIST KINOFORMS MANUFACTURED WITH DIRECT-WRITING, ELECTRON-BEAM LITHOGRAPHY
    LARSSON, M
    EKBERG, M
    NIKOLAJEFF, F
    HARD, S
    APPLIED OPTICS, 1994, 33 (07): : 1176 - 1179
  • [5] Direct writing of patterned ceramics using electron-beam lithography and metallopolymer resists
    Clendenning, SB
    Aouba, S
    Rayat, MS
    Grozea, D
    Sorge, JB
    Brodersen, PM
    Sodhi, RNS
    Lu, ZH
    Yip, CM
    Freeman, MR
    Ruda, HE
    Manners, I
    ADVANCED MATERIALS, 2004, 16 (03) : 215 - +
  • [6] Precise proximity correction for fabricating chirped diffraction gratings with the direct-writing electron-beam lithography
    Okano, M
    Yotsuya, T
    Hirai, Y
    Kikuta, H
    Yamamoto, K
    LITHOGRAPHIC AND MICROMACHINING TECHNIQUES FOR OPTICAL COMPONENT FABRICATION, 2001, 4440 : 268 - 276
  • [7] Proximity-compensated blazed transmission grating manufacture with direct-writing, electron-beam lithography
    Ekberg, M.
    Nikolajeff, F.
    Larsson, M.
    Hard, S.
    Doktorsavhandlingar vid Chalmers Tekniska Hogskola, 1997, (1263): : 103 - 107
  • [8] PROXIMITY-COMPENSATED BLAZED TRANSMISSION GRATING MANUFACTURE WITH DIRECT-WRITING, ELECTRON-BEAM LITHOGRAPHY
    EKBERG, M
    NIKOLAJEFF, F
    LARSSON, M
    HARD, S
    APPLIED OPTICS, 1994, 33 (01): : 103 - 107
  • [9] Fabrication of ultrasmall tunnel junctions by electron beam direct-writing
    Born, D
    Wagner, T
    Krech, W
    Hübner, U
    Fritzsch, L
    IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY, 2001, 11 (01) : 373 - 376
  • [10] Direct-Writing of Cu Nano-Patterns with an Electron Beam
    Lai, Shih-En
    Hong, Ying-Jhan
    Chen, Yu-Ting
    Kang, Yu-Ting
    Chang, Pin
    Yew, Tri-Rung
    MICROSCOPY AND MICROANALYSIS, 2015, 21 (06) : 1639 - 1643
12345