Rapid fabrication of ZnO film by electrochemical deposition method from aqueous solution

Recently, ZnO film paid much attention, for many application such as transparent conductive film and photo devise. In order to use as transparent conductive film, ZnO films need be obtained at high growth rate. Fabrication of oxide films by electrochemical deposition from aqueous solutions is possible to fabrication at low temperature. And thickness and electric characteristics of ZnO film can be easily controlled by electrochemical parameters. Mentioned above, this electrochemical deposition is optimal technique for manufacturing technique for transparent conductive film. We will support that the adjustment of the alkaline electrolyte for ZnO film gives the rapidly growth of ZnO films at low temperature. In this investigation, the influence of the electrical and optical properties for ZnO films with the deposition temperature will be investigated. For optical and electrical results, the growth rate and the carrier concentration of ZnO films increase with an increase in the deposition temperature. And the optical bandgap energy is constant at about 3.37eV. Thus, the electric property and deposition rate of ZnO film will be controlled by the deposition temperature. © 2020 The Institute of Electrical Engineers of Japan.