Non-mutative cell viability measurement on an IGZO transparent thin film transistor electrode array

被引:0
|
作者
Cathcart G.A. [1 ]
Tixier-Mita A. [1 ,2 ]
Ihida S. [2 ]
Eiler A.-C. [1 ]
Toshiyoshi H. [2 ]
机构
[1] Research Center for Advanced Science and Technology (RCAST), University of Tokyo, 4-6-1, Komaba, Meguro-ku, Tokyo
[2] Institute of Industrial Science (IIS), University of Tokyo, 4-6-1, Komaba, Meguro-ku, Tokyo
关键词
BioTFT; Cell Viability; HepG2; Impedance;
D O I
10.1541/IEEJSMAS.140.193
中图分类号
学科分类号
摘要
In this work we present the use of a transparent thin film transistor (tTFT) substrate to perform non-mutative cell viability measurements through purely electrical means. This is done through the measurement of the impedance of a region of the cellular culture and monitoring its change. By mapping this with simultaneous fluorescent measurements we managed to build predictive models for cell viability that obviate the need for mutative dyes while still enabling their use for simultaneous or subsequent measurement. © 2020 The Institute of Electrical Engineers of Japan.
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页码:193 / 200
页数:7
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