Theory of High Field Transport in β-Ga2O3

被引:0
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作者
Ghosh K. [1 ,2 ]
Singisetti U. [2 ]
机构
[1] TCAD Department, Intel Corporation, Hillsboro, 97124, OR
[2] Electrical Engineering Department, University at Buffalo, Buffalo, 14260, NY
关键词
Ga[!sub]2[!/sub]O[!sub]3[!/sub; high field transport; impact ionization; velocity;
D O I
10.1142/S0129156419400081
中图分类号
学科分类号
摘要
We present a comprehensive review of high-field transport properties in an emerging and trending ultra-widebandgap semiconductor β-Ga2O3. The focus is on the theoretical understanding of the microscopic mechanisms that control the dynamics of farfrom-equilibrium electrons. A manifold of density functional calculations and Boltzmann theory based transport formalism unravels the behavior of the electron distribution under a varied range of external electric fields. The key high-field transport properties that govern electronic device performance, like velocity and ionization co-efficients, are enlightened in detail with physical insights. Anisotropies in the above transport co-efficients are probed from the microscopic investigation of bandstructure, electron-phonon interactions, and electron-electron interactions. © 2019 World Scientific Publishing Company.
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