High-K dielectric-modulated dual-cavity MOSHEMT with III-V nitride GaN/AlGaN semiconductors: application as biosensor

被引:0
|
作者
Saha, Tulip Kumar [1 ,2 ]
Mukherjee, Moumita [3 ]
Dhar, Rudra Sankar [1 ]
机构
[1] Natl Inst Technol Mizoram, Dept Elect & Commun Engn, Aizawl 796012, India
[2] Adamas Univ, Sch Engn & Technol, Dept Elect & Commun Engn, Kolkata 700126, West Bengal, India
[3] Adamas Univ, Sch Basic & Appl Sci, Dept Phys, Kolkata 700126, West Bengal, India
来源
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 2025年 / 31卷 / 02期
关键词
FIELD-EFFECT TRANSISTOR; HEMT; SENSITIVITY; SENSOR; LAYER; FET;
D O I
10.1007/s00542-024-05789-7
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, the authors developed a novel detection technique based on a dielectric modulated-dual cavity metal-oxide-semiconductor high electron mobility transistor (DMDC-MOSHEMT) using high-K material for fast, precise, and reliable detection. The effect of high-K materials on the performance and behavior of dual cavity MOSHEMT-based biosensors is investigated. In two dimensional electron gas (2DEG), the use of high-K material reduces off-current and enhances carrier confinement. As a result, the current generation of devices has been improved. Silvaco Atlas is used for numerical modeling. The simulation is used to investigate various performance parameters and compare them to SiO2 MOSHEMT-based biosensors which is useful for detection of biomolecules. Experimental observation is used to verify and validate the proposed model. The use of high-K materials in AlGaN/GaN dual cavity MOSHEMT biosensors for effective label-free biomolecule detection is described for the first time in this article. Using high- K materials, AlGaN/GaN MOSHEMTs are excellent candidates for biosensor fabrication. The variation of AlGaN barrier layer thickness and Al content in AlGaN barrier layer are studied for getting better drain-on-sensitivity and threshold voltage sensitivity of biosensor.
引用
收藏
页码:521 / 532
页数:12
相关论文
共 16 条
  • [1] A Dielectric-Modulated Normally-Off AlGaN/GaN MOSHEMT for Bio-Sensing Application: Analytical Modeling Study and Sensitivity Analysis
    Mishra, S. N.
    Jena, K.
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2019, 74 (04) : 349 - 357
  • [2] A Dielectric-Modulated Normally-Off AlGaN/GaN MOSHEMT for Bio-Sensing Application: Analytical Modeling Study and Sensitivity Analysis
    S. N. Mishra
    K. Jena
    Journal of the Korean Physical Society, 2019, 74 : 349 - 357
  • [3] Effect of high-k dielectric HfO2 on performance of AlGaN/GaN based MOSHEMT for RF applications
    Shashank Kumar Dubey
    Aminul Islam
    Microsystem Technologies, 2024, 30 : 163 - 175
  • [4] Effect of high-k dielectric HfO2 on performance of AlGaN/GaN based MOSHEMT for RF applications
    Dubey, Shashank Kumar
    Islam, Aminul
    MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2024, 30 (02): : 163 - 175
  • [5] Effects of a High-k Dielectric on the Performance of III-V Ballistic Deflection Transistors
    Kaushal, Vikas
    Iniguez-de-la-Torre, Ignacio
    Gonzalez, Tomas
    Mateos, Javier
    Lee, Bongmook
    Misra, Veena
    Margala, Martin
    IEEE ELECTRON DEVICE LETTERS, 2012, 33 (08) : 1120 - 1122
  • [6] III-V Junctionless Nanowire Transistor with High-k Dielectric Material and Schottky Contacts
    Chatterjee, Neel
    Gupta, Akriti
    Pandey, Sujata
    JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS, 2017, 12 (09) : 925 - 931
  • [7] Development of high-k dielectric for Antimonides and a sub 350°C III-V pMOSFET outperforming Germanium
    Nainani, Aneesh
    Irisawa, Toshifumi
    Yuan, Ze
    Sun, Yun
    Krishnamohan, Tejas
    Reason, Matthew
    Bennett, Brian R.
    Boos, J. Brad
    Ancona, Mario G.
    Nishi, Yoshio
    Saraswat, Krishna C.
    2010 INTERNATIONAL ELECTRON DEVICES MEETING - TECHNICAL DIGEST, 2010,
  • [8] Elemental Profiling of III-V MOSFET High-k Dielectric Gate Stacks Using EELS Spectrum Imaging
    Longo, P.
    Craven, A. J.
    Scott, J.
    Holland, M.
    Thayne, I.
    MICROSCOPY OF SEMICONDUCTING MATERIALS 2007, 2008, 120 : 317 - +
  • [9] Nanostructuring of Ultra-Thin HfO2 Layers for High-k/III-V Device Application
    Benedicto, M.
    Anguita, J.
    Alvaro, R.
    Galiana, B.
    Molina-Aldereguia, J. M.
    Tejedor, P.
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2011, 11 (10) : 8848 - 8852
  • [10] Demonstration of high thermal performance GaN-on-graphite composite bonded substrate for application in III-V nitride electronics
    Li, Lei
    Obata, Tomohiro
    Fukui, Aozora
    Takeuchi, Kai
    Suga, Tadatomo
    Tanaka, Atsushi
    Wakejima, Akio
    APPLIED PHYSICS EXPRESS, 2021, 14 (09)