Capturing droplet flight and impingement behavior in plasma-MIG process for metal droplet-on-demand applications (vol 316, 117955, 2023)

被引：0

作者：

Kapil, Angshuman ^{[1
]}

Kayarthaya, Nithin ^{[2
,3
]}

Sharma, Vatsalya ^{[4
]}

Sharma, Abhay ^{[1
,5
]}

机构：

[1] Katholieke Univ Leuven, Dept Mat Engn, Campus Nayer, B-2860 St Katelijne Waver, Belgium

[2] Katholieke Univ Leuven, Fac Engn Technol, Campus Nayer, B-2860 Sintt Katelijne Waver, Belgium

[3] Smulders Projects Belgium, Leo Bosschartlaan 20, B-2660 Antwerp, Belgium

[4] Katholieke Univ Leuven, Ctr Math Plasma Astrophys CmPA, B-3001 Leuven, Belgium

[5] Indian Inst Technol Jammu, Dept Mech Engn, Jammu 181221, India

来源：

关键词：

D O I：

10.1016/j.jmatprotec.2024.118556

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页数：2