The Effects of Nitrogen Content on the Mechanical and Tribological Properties of CrTaWNx Thin Films

被引：1

作者：

Chang, Li-Chun ^{[1
,2
]}

Wang, Li-Zhu ^{[3
]}

Chen, Yung-, I ^{[3
]}

机构：

[1] Ming Chi Univ Technol, Dept Mat Engn, New Taipei 243303, Taiwan

[2] Ming Chi Univ Technol, Ctr Plasma & Thin Film Technol, New Taipei 243303, Taiwan

[3] Natl Taiwan Ocean Univ, Dept Optoelect & Mat Technol, Keelung 202301, Taiwan

来源：

COATINGS | 2024年 / 14卷 / 08期

关键词：

co-sputtering; mechanical properties; residual stress; tribological properties; MICROSTRUCTURE; COATINGS; SUBSTRATE; HARDNESS; MODULUS;

D O I：

10.3390/coatings14080939

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In the study described herein, CrTaWNx thin films were deposited on Si and 304 stainless-steel (SUS304) substrates through magnetron co-sputtering using CrW and Ta targets. The nitrogen flow ratio (f(N2) = [N-2/(N-2 + Ar)]) was adjusted to 0.05, 0.2, 0.4, and 0.5 to fabricate CrTaWNx films with various N contents. The CrTaWNx films prepared at a low f(N2) of 0.05 exhibited a low stoichiometric ratio x of 0.16 and a nanocrystalline structure. In contrast, the CrTaWNx films fabricated at an f(N2) of 0.2-0.5 exhibited x values of 0.42-0.62 and formed a face-centered cubic phase. The nanocrystalline (Cr0.34Ta0.20W0.46)N-0.16 film exhibited mechanical properties and wear resistances that were inferior to those of the crystalline CrTaWNx thin films. A (Cr0.38Ta0.15W0.47)N-0.55 film exhibited a hardness of 25.2 GPa, an elastic modulus of 289 GPa, and a low wear rate of 0.51 x 10(-5) mm(3)/Nm.

引用

页数：14

共 50 条

[1] Effect of nitrogen content on nanostructure and mechanical properties of TiCxNy thin films
Wang, J. P.
Lu, Y. H.
Shen, Y. G.
SURFACE ENGINEERING, 2011, 27 (03) : 169 - 173
[2] Effect of nitrogen content on the microstructure and mechanical properties of CNx thin films
de Sánchez, NA
Carrasco, C
Prieto, P
PHYSICA B-CONDENSED MATTER, 2003, 337 (1-4) : 318 - 322
[3] Sputter deposited NbCxNy films: Effect of nitrogen content on structure and mechanical and tribological properties
Zhang, Kan
Wen, M.
Wang, S.
Deng, R. P.
Gall, D.
Zheng, W. T.
SURFACE & COATINGS TECHNOLOGY, 2014, 258 : 746 - 753
[4] Effect of the Si content on the structure, mechanical and tribological properties of CrN/AlSiN thin films
Van-Vinh Le
Thi-Trang Nguyen
Kim, Sun-Kyu
Khac-Hung Pham
SURFACE & COATINGS TECHNOLOGY, 2013, 218 : 87 - 92
[5] COMPOSITIONAL, MICROSTRUCTURAL AND MORPHOLOGICAL EFFECTS ON THE MECHANICAL AND TRIBOLOGICAL PROPERTIES OF CHROMIUM NITROGEN FILMS
BULL, SJ
RICKERBY, DS
SURFACE & COATINGS TECHNOLOGY, 1990, 43-4 (1-3): : 732 - 744
[6] Influence of nitrogen content on the structural, electrical and mechanical properties of CrNx thin films
Zhang, G. A.
Yan, P. X.
Wang, P.
Chen, Y. M.
Zhang, J. Y.
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2007, 460 (301-305): : 301 - 305
[7] Influence of nitrogen content on the structural, mechanical and electrical properties of TiN thin films
Vaz, F
Ferreira, J
Ribeiro, E
Rebouta, L
Lanceros-Méndez, S
Mendes, JA
Alves, E
Goudeau, P
Rivière, JP
Ribeiro, F
Moutinho, I
Pischow, K
de Rijk, J
SURFACE & COATINGS TECHNOLOGY, 2005, 191 (2-3): : 317 - 323
[8] Influence of Nitrogen Content and Bias Voltage on Residual Stress and the Tribological and Mechanical Properties of CrAlN Films
Tang, Jian-Fu
Lin, Ching-Yen
Yang, Fu-Chi
Chang, Chi-Lung
COATINGS, 2020, 10 (06)
[9] Influence of Nitrogen gas flow on mechanical and tribological properties of sputtered chromium nitride thin films
Jafarzadeh, Morteza
Khojier, Kaykhosrow
Savaloni, Hadi
ULTRAFINE GRAINED AND NANO-STRUCTURED MATERIALS IV, 2014, 829 : 497 - +
[10] Structure, mechanical and tribological properties of sputtered TiAlBN thin films
Rebholz, C
Schneider, JM
Voevodin, AA
Steinebrunner, J
Charitidis, C
Logothetidis, S
Leyland, A
Matthews, A
SURFACE & COATINGS TECHNOLOGY, 1999, 113 (1-2): : 126 - 133

← 1 2 3 4 5 →