Low-voltage solution-processed Sn-doped CuI neuromorphic transistors with synaptic plasticity and pain mimicked

In this article, SnxCu1-xI thin-film transistors were fabricated on a glass substrate, with CuI doped with varying concentrations of SnI2 serving as the channel and chitosan as the dielectric. When x = 0.06, the device exhibited optimal performance: a current on/off ratio of 2.56 x 10(5), a subthreshold slope of 31.67 mV/dec, a threshold voltage of 1.33 V, and a saturated field-effect mobility of 21.75 cm(2) V-1 s(-1). Due to the electric double layer effect of chitosan, the operating voltage of the devices was reduced to below 2 V. Simulations were also conducted on the behavior and functionality of artificial synapses, such as short-term plasticity, long-term plasticity, and paired-pulse facilitation. Building upon the functionalities of artificial synapses, the Sn0.06Cu0.94I neuromorphic transistors simulated the fundamental pain perception function of biological nociceptors. Finally, the effects of bias stress and laser irradiation on the devices were investigated, indicating the excellent stability of the Sn0.06Cu0.94I neuromorphic transistors. Fabricated via the solution process, this low-voltage neuromorphic transistors hold significant implications for applications in bionic sensing systems and neuromorphic chip technology.