The Value of In-Line Metrology for Advanced Process Control

被引:0
|
作者
Lee, Jaeho [1 ]
Kim, Mike Young-Han [2 ,3 ]
Eun, Yongsoon [1 ]
机构
[1] DGIST, EECS, Daegu, South Korea
[2] Univ Calif San Diego, La Jolla, CA 92093 USA
[3] Gauss Labs Inc, Palo Alto, CA USA
关键词
D O I
10.1109/ASMC61125.2024.10545372
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In-line metrology provides critical information for feedback and feedforward process control. In high-volume manufacturing, the fundamental question is: how fast, how frequent, and how accurate measurements should be made to satisfy control requirements. This paper develops a framework to study the tradeoff among the sampling rate, the delay, and the quality of measurements and the effect of these canonical factors on the variability of processes. As a consequence of this fundamental tradeoff, the relative value of virtual metrology with respect to real metrology can be quantified in the context of advanced process control.
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页数:4
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