Comparative analysis of different microfluidic cooling technologies for high performance chips

被引:0
|
作者
Feng, Jianyu [1 ,2 ]
Chen, Chuan [1 ]
Fu, Rong [1 ]
Cao, Liqiang [1 ]
机构
[1] Chinese Acad Sci, Inst Microelect, Beijing, Peoples R China
[2] Univ Chinese Acad Sci, Beijing, Peoples R China
基金
中国国家自然科学基金;
关键词
thermal management; hotspots; microfluidic cooling; spreading thermal resistance;
D O I
10.1109/ICEPT59018.2023.10491892
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Thermal management has emerged as a crucial factor restricting device functionality and lifetime. The enhancement of IC fabrication technology has led to a dramatical increase in chip performance and power density. The heat flux of hotspots in the future will approach 1000W/cm(-2). This article provides a theoretical analysis that compares the distribution of thermal resistance among three cooling schemes: remote cooling, near-die cooling, and die-embedded cooling. The results indicate that selecting TIM1 with high thermal conductivity can significantly diminish the thermal resistance of remote cooling and near-die cooling in the case of uniform heating and single hotspot heating. This study provides a valuable reference for engineers in selecting microfluidic cooling schemes for high performance chips.
引用
收藏
页数:4
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