Design Strategies of Nanofillers in Photosensitive Polyimide Nanocomposites

被引:0
|
作者
Wang, Tao [1 ]
Li, Jinhui [1 ]
Niu, Fangfang [2 ]
Zhang, Guoping [1 ]
Sun, Rong [1 ]
机构
[1] Chinese Acad Sci, Shenzhen Inst Adv Technol, Shenzhen Inst Adv Elect Mat, Shenzhen, Peoples R China
[2] Shenzhen Univ, Coll Phys & Optoelect Engn, Key Lab Optoelect Devices & Syst Minist Educ & Gu, Shenzhen, Peoples R China
基金
中国国家自然科学基金;
关键词
photosensitive polyimide; nanocomposites; low-temperature curable; electronic packaging;
D O I
10.1109/ICEPT59018.2023.10492271
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The demand for next-generation photosensitive polyimide (PSPI) is low-temperature curable and low-dielectric properties. In this paper, a curing accelerator (aminoquinoline, AQL) was used to modify submicron fluorinated carbon (FC), and prepared a submicron quinoline modified fluorinated carbon (QL-FCO) nanofiller. QL-FCO can enhance the mechanical and dielectric properties of the nanocomposites, and the quinoline groups on its surface can also promote the curing process of PSPI, so that the low-temperature cured PSPI has excellent comprehensive properties. The QL-FCO/PI cured at 200. have a high imidization degree (>100%), and excellent mechanical, thermal, and dielectric properties, which are better than pure PI cured at 300.. After spin-coating, pre-baking, photolithography, development, and curing, QL-FCO/PSPI can obtain patterns with a resolution of up to 5 mu m. Although there is still a small amount of filler aggregates on the pattern, it does not affect the L/S patterns.
引用
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页数:4
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