Cellular automata model of anodization

被引:3
|
作者
Bartosik, Lukasz [1 ]
Stafiej, Janusz [2 ]
Di Caprio, Dung [3 ]
机构
[1] Polish Acad Sci, Inst Phys Chem, Warsaw, Poland
[2] Cardinal Stefan Wyszynski Univ, Dept Math & Nat Sci, Warsaw, Poland
[3] PSL Res Univ, Chim ParisTech CNRS, Inst Rech Chim Paris, F-75005 Paris, France
关键词
Anodization; Cellular automata; Parallel programing; Aluminum oxide growth; PORE ARRAYS; SIMULATION; GROWTH; FILMS;
D O I
10.1016/j.jocs.2015.06.003
中图分类号
TP39 [计算机的应用];
学科分类号
081203 ; 0835 ;
摘要
We present a cellular automata model to simulate with a parallelized code nanostructured alumina formation during anodization. The model is based on the Field Assisted Dissolution approach for anodization. The parallel code for model simulation is run on Nvidia Tesla GPU cards. We verify that the parallel algorithm yields correct analytical results for the simple exclusion diffusion between emitting and absorbing walls in 3D. We identify the model parameters that have a strong impact on the nanostructures obtained in simulations and present the diagram of prevalence of these structures. We also simulate in our model the so called "two step anodization" and find an agreement with experimental findings. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:309 / 316
页数:8
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