Fabrication of Holographic Lithography Micro-Nano Gratings Using Metal Mask

被引：0

作者：

Gong C. ^{[1
]}

Fan J. ^{[1
]}

Zou Y. ^{[1
]}

Wang H. ^{[1
]}

Zhao X. ^{[1
]}

Ma X. ^{[1
]}

Cui C. ^{[2
]}

Song Z. ^{[2
]}

机构：

[1] State Key Laboratory of High Power Semiconductor Laser, Changchun University of Science and Technology, Changchun, 130022, Jilin

[2] The First Military Representative Office of the Army in Changchun, Changchun, 130103, Jilin

来源：

Zhongguo Jiguang/Chinese Journal of Lasers | 2019年 / 46卷 / 12期

关键词：

Dry etching; Gratings; Hard mask; Holographic lithography;

D O I：

10.3788/CJL201946.1203001

中图分类号：

学科分类号：

摘要：

The fabrication process of holographic lithography micro-nano gratings using metal masks is designed and optimized. First, an 860 nm periodic grating is prepared using holographic lithography and inductively coupled plasma (ICP) dry etching on the GaAs substrate. The hard metal mask grown by magnetron sputtering is introduced into the etching process as a barrier layer for grating etching and the Ni mask is fabricated by the lift-off method. It has been shown that when photoresist, SiO2, and Ni are used as masks for ICP dry etching, they determine the etching depth and morphology of the grating. Results show that the Ni mask has strong etch resistance. Scanning electron microscopy demonstrates that Ni with a thickness of 50 nm can be used as a hard mask to create a grating with an aspect ratio of about 4.9. The grating has a groove width and etching depth of 300 nm and 1454 nm, respectively, with steep sidewall morphology and good periodicity and uniformity. © 2019, Chinese Lasers Press. All right reserved.

引用

共 23 条

[1] Du J.Y., Li H., Qu Y., Et al., Design of distributed Bragg grating in 1064 nm narrow linewidth DBR lasers, 2015 International Conference on Optoelectronics and Microelectronics (ICOM), pp. 348-350, (2015)
[2] Jia P., Liu X.L., Chen Y.Y., Et al., Study of dual-wavelength distributed Bragg reflection semiconductor laser with high order Bragg gratings, Chinese Journal of Lasers, 42, 8, (2015)
[3] Bickford J.R., Cho P.S., Farrell M.E., Et al., The investigation of subwavelength grating waveguides for photonic integrated circuit based sensor applications, IEEE Journal of Selected Topics in Quantum Electronics, 25, 3, (2019)
[4] Agarwal A.J., Kumar M., Jaiswal A.K., Et al., Analysis to compensate dispersion in optical communication link using chirp grating, International Journal of Electronics & Computer Science Engineering, 2, 3, pp. 980-986, (2013)
[5] Golovastikov N.V., Bykov D.A., Doskolovich L.L., Et al., Spatiotemporal optical pulse transformation by a resonant diffraction grating, Journal of Experimental and Theoretical Physics, 121, 5, pp. 785-792, (2015)
[6] Lu Q., Li W.H., Bayanheshig, Et al., Interferometric precision displacement measurement system based on diffraction grating, Chinese Optics, 10, 1, pp. 39-50, (2017)
[7] Pachnicke S., Zhu J.N., Lawin M., Et al., Tunable WDM-PON system with centralized wavelength control, Journal of Lightwave Technology, 34, 2, pp. 812-818, (2016)
[8] Wagner C., Eiselt M.H., Lawin M., Et al., Impairment analysis of WDM-PON based on low-cost tunable lasers, Journal of Lightwave Technology, 34, 22, pp. 5300-5307, (2016)
[9] Diba A.S., Xie F., Gross B., Et al., Application of a broadly tunable SG-DBR QCL for multi-species trace gas spectroscopy, Optics Express, 23, 21, pp. 27123-27133, (2015)
[10] Spiebetaberger S., Schiemangk M., Wicht A., Et al., DBR laser diodes emitting near 1064 nm with a narrow intrinsic linewidth of 2 kHz, Applied Physics B, 104, 4, pp. 813-818, (2011)

← 1 2 3 →