Ab initio supported development of Nb- and Ta-alloyed (Ti,Al)N thin films with improved thermal stability

被引:3
|
作者
Hu, Chun [1 ,2 ]
Zhang, Jie [1 ,2 ]
Liu, Hui J. [3 ]
Du, J. W. [1 ]
Chen, Li [1 ,3 ]
Kong, Yi [1 ]
Mayrhofer, Paul H. [2 ]
机构
[1] Cent South Univ, State Key Lab Powder Met, Changsha 410083, Peoples R China
[2] TU Wien, Inst Mat Sci & Technol, Getreidemarkt 9, A-1060 Vienna, Austria
[3] Zhuzhou Cemented Carbide Cutting Tools Co LTD, Zhuzhou 412007, Peoples R China
来源
基金
中国国家自然科学基金;
关键词
Ab initio; (Ti; Al; Nb)N; Ta)N; Age hardening; Oxidation resistance; TI-AL-N; OXIDATION RESISTANCE; MECHANICAL-PROPERTIES; ELECTRONIC ORIGIN; PHASE-STABILITY; TIALN COATINGS; HARDNESS; CR; HF; MICROSTRUCTURE;
D O I
10.1016/j.surfcoat.2024.130763
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Metastable (Ti,Al)N thin films with face -centered cubic (fcc) structure are widely applied to protect tools and components used in the machining industry for their high hardness and exceptional thermal stability. Alloying is a simple but powerful strategy to further improve the performance of (Ti,Al)N thin films. Here, the combination of experiments and ab initio calculations allowed us to further improve the mechanical properties, thermal stability, and oxidation resistance of arc-evaporated (Ti,Al)N films through the addition of Nb and Ta. The developed Ti 0.40 Al 0.53 Nb 0.07 N, Ti 0.34 Al 0.52 Nb 0.14 N, Ti 0.40 Al 0.53 Ta 0.07 N, and Ti 0.34 Al 0.50 Ta 0.16 N thin films show a single-phase fcc structure like Ti 0.46 Al 0.54 N. While the hardness ( H ) of as-deposited (Ti,Al,Nb)N thin films is similar to that of Ti 0.46 Al 0.54 N (30.1 +/- 0.4 GPa), it increases to 33.2 +/- 0.7 and 34.1 +/- 1.1 GPa by alloying with 7 and 16 at.% Ta (metal fraction), respectively. Both alloying elements allow to retard the spinodal decomposition of (Ti,Al)N, as suggested by X-ray diffraction of vacuum-annealed samples. The (Ti,Al)N and (Ti,Al,Nb)N samples exhibit the onset of wurtzite (w-) AlN formation at -1050 degrees C, which is postponed to -1200 degrees C for the (Ti,Al,Ta) N thin films. Ab initio calculations suggest that age hardening of (Ti,Al)N is improved by Nb and Ta, with Nb being more effective than Ta. This is verified by experiments showing that Ti 0.40 Al 0.53 Nb 0.07 N (Ti 0.34 Al 0.52 Nb 0.14 N) and Ti 0.40 Al 0.53 Ta 0.07 N (Ti 0.34 Al 0.50 Ta 0.16 N) experience an increase of H to 34.7 +/- 0.5 GPa (36.7 +/- 0.7 GPa) and 35.8 +/- 1.0 GPa (37.0 +/- 1.1 GPa) when annealed at 1000 degrees C, compared to the 32.4 +/- 0.7 GPa of Ti 0.46 Al 0.54 N annealed at 900 degrees C. The relative H increase is thus higher for (Ti,Al,Nb)N than for (Ti,Al,Ta) N. Furthermore, Nb and Ta also improve the oxidation resistance of (Ti,Al)N with Ta being more effective than Nb. Based on these results we can conclude that both Nb and Ta elements improve hardness, thermal stability, and oxidation resistance of (Ti,Al)N, with Nb providing more relative hardness gain but Ta providing higher absolute values.
引用
收藏
页数:11
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