Plasma Spatial Distribution and Transport Behavior of High Power Impulse Magnetron Sputtering in Cylindrical Cathode

被引：0
|
作者：
Cui S. [1 ]
Li T. [1 ]
Li R. [1 ]
Wu Z. [1 ]
Ma Z. [1 ]
Wu Z. [1 ]
机构：
[1] School of Advanced Materials, Peking University, Shenzhen Graduate School, Shenzhen
来源：
Zhongguo Biaomian Gongcheng/China Surface Engineering | 2022年 / 35卷 / 05期
关键词：
discharge in cylindrical cathode; plasma simulation; plasma spatial distribution; plasma transport behavior;
D O I：
10.11933/j.issn.1007-9289.20220123001
中图分类号：
学科分类号：
摘要：
Understanding of plasma spatial distribution and transport behavior in high power pulsed magnetron sputtering (HiPIMS) is the key to control the deposition process and optimize the properties of coatings. Especially for HiPIMS in cylindrical cathode, the plasma distribution and the transport process are more complex, and the particle motion behavior is determined by various factors. Aiming at the HiPIMS discharge in cylindrical coupled with the electromagnetic system, the reaction and the movement of the main particles in Ar/N2/Cr system are studied. The evolution processes of Ar, N2 and Cr particles are simulated with the test particle Monte Carlo (MC) model. The simulation results reveal that different particles present different spatial distribution. In particular, the metal ion Cr+ with large mass and high ionic energy shows the narrowest output beam, while the gas ion N+ with low mass and ionic energy shows the widest output beam range. The characteristic spectrums of Ar+, N+ and Cr+ are detected by the optical emission spectrometer (OES), and the spatial evolutions are in consistent with the simulation. Finally, a serious of CrxN coatings with different Cr/N ratios are prepared by at different deposition positions. In this way, coatings with multiple components can be prepared at one time, and coatings with certain component can be prepared under control. © 2022 Chinese Mechanical Engineering Society. All rights reserved.
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页码：163 / 171
页数：8
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