Molecular dynamics simulations of La2O3 thin films on SiO2

被引:0
|
作者
Mou Fang [1 ,2 ,3 ]
Stephen P.Kelty [4 ]
Xiangming He [1 ,2 ,3 ]
机构
[1] Institute of Nuclear and New Energy Technology,Tsinghua University
[2] State Key Laboratory of Automotive Safety and Energy,Tsinghua University
[3] Huadong Institute of Lithium Ion Battery
[4] Department of Chemistry and Biochemistry,Seton Hall University
关键词
molecular dynamics simulation; heteroepitaxia thin film; interface; lattice mismatch; equilibrium state;
D O I
暂无
中图分类号
TB383.2 [];
学科分类号
070205 ; 080501 ; 1406 ;
摘要
Classical molecular dynamics is used to investigate the equilibrium state of the surface region and interface of heteroepitaxial LaOthin films.Due to the lattice mismatch,heteroepitaxial thin films are subject to very large stress.For this reason the behavior of LaOthin films at SiOinterface becomes an important concern.Our result indicates that LaOcan uniformly wet SiOsurface.The properties of the simulated films are analyzed and the lack of any discernible crystalline phase in epitaxial LaOon SiOindicates that the lattice mismatch between SiOand LaOis sufficiently large to prevent the formation of even short-range orders in LaOfilm.
引用
收藏
页码:282 / 286
页数:5
相关论文
共 50 条
  • [1] Molecular dynamics simulations of La2O3 thin films on SiO2
    Fang, Mou
    Kelty, Stephen P.
    He, Xiangming
    JOURNAL OF ENERGY CHEMISTRY, 2014, 23 (03) : 282 - 286
  • [2] LIQUID IMMISCIBILITY IN THE SIO2 + MGO, SIO2 + SRO, SIO2 + LA2O3, AND SIO2 + Y2O3 SYSTEMS
    HAGEMAN, VBM
    OONK, HAJ
    PHYSICS AND CHEMISTRY OF GLASSES, 1986, 27 (05): : 194 - 198
  • [3] Characterization and tribological investigation of SiO2 and La2O3 sol-gel films
    Zhang, WG
    Liu, WM
    Wang, CT
    APPLIED SURFACE SCIENCE, 2001, 185 (1-2) : 34 - 43
  • [4] Molecular dynamics simulation of amorphous SiO2 thin films
    Duong Thi Nhu Tranh
    Vo Van Hoang
    EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2015, 70 (01):
  • [5] Passivation of SiO2/SiC Interface with La2O3 Capped Oxidation
    Munekiyo, S.
    Lei, Y. M.
    Natori, K.
    Iwai, H.
    Kawanago, T.
    Kakushima, K.
    Kataoka, K.
    Nishiyama, A.
    Sugii, N.
    Wakabayashi, H.
    Tsutsui, K.
    Furuhashi, M.
    Miura, N.
    Yamakawa, S.
    2014 IEEE WORKSHOP ON WIDE BANDGAP POWER DEVICES AND APPLICATIONS (WIPDA), 2014, : 113 - 115
  • [6] Structure and stability of La2O3/SiO2 layers on Si(001)
    Stemmer, S
    Maria, JP
    Kingon, AI
    APPLIED PHYSICS LETTERS, 2001, 79 (01) : 102 - 104
  • [7] Influence of La2O3 promoter on the structure of MnOx/SiO2 catalysts
    R. Craciun
    N. Dulamita
    Catalysis Letters, 1997, 46 : 229 - 234
  • [8] Influence of La2O3 promoter on the structure of MnOx/SiO2 catalysts
    Craciun, R
    Dulamita, N
    CATALYSIS LETTERS, 1997, 46 (3-4) : 229 - 234
  • [9] Growth and characterization of Peald deposited La2O3 on SiO2/Si
    Borokar, Vaibhav Y.
    Barhate, Viral
    Desale, Bhushan
    Mahajan, Ashok
    INTERNATIONAL JOURNAL OF MODERN PHYSICS B, 2024, 38 (12N13):
  • [10] Characterization of La2O3/SiO2 mixed oxide catalyst supports
    Vidal, H
    Bernal, S
    Baker, RT
    Finol, D
    Omil, JAP
    Pintado, JM
    Rodríguez-Izquierdo, JM
    JOURNAL OF CATALYSIS, 1999, 183 (01) : 53 - 62