LOW-ENERGY ION-BEAM ETCHING

被引：0
|
作者：
HARPER, JME
CUOMO, JJ
LEARY, PA
SUMMA, GM
KAUFMAN, HR
BRESNOCK, FJ
机构：
[1] IBM CORP,RES LAB,SAN JOSE,CA 95193
[2] COLORADO STATE UNIV,FT COLLINS,CO 80523
[3] IBM CORP,DIV SYST PROD,HOPEWELL JUNCTION,NY 12533
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C108 / C109
页数：2
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