COMPARISON OF DIFFERENT DEPOSITION TECHNIQUES FOR EPITAXIAL COSI2 FILMS ON SI(111) BY HRTEM

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作者：
MEISER, S
ADAMSKI, C
RAHMAN, SH
BASCHEK, G
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MICROSCOPY OF SEMICONDUCTING MATERIALS 1989 | 1989年 / 100卷
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T [工业技术];
学科分类号：
08 ;
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页码：647 / 652
页数：6
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