INVESTIGATION OF HYDRATION PROPERTIES OF CHEMICALLY VAPOR-DEPOSITED SILICON DIOXIDE FILMS BY MEANS OF ELLIPSOMETRY

被引：4

|

作者：

DEROOIJ, NF

SIEVERDINK, RJS

TROMP, RM

机构：

来源：

THIN SOLID FILMS | 1977年 / 47卷 / 03期

关键词：

D O I：

10.1016/0040-6090(77)90036-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

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页码：211 / 218

页数：8

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