TILT-TARGET MAGNETRON SPUTTER FOR DEPOSITION OF MAGNETOOPTICAL DISK

被引:3
|
作者
CHAO, S [1 ]
HSIAO, TC [1 ]
HUANG, DR [1 ]
JENG, TR [1 ]
机构
[1] IND TECHNOL RES INST,OPTOELECTR & SYST LAB,HSINCHU 310,TAIWAN
关键词
MAGNETOOPTICAL DISK; TILT TARGET; COMPOSITION UNIFORMITY;
D O I
10.1143/JJAP.31.426
中图分类号
O59 [应用物理学];
学科分类号
摘要
A 3.5-inch magnetooptical disk is made by tilting the TbFeCo target in a DC circular magnetron sputtering process. The composition of the recording layer is controlled by using the Tb-rich deposition area. The optimal tilt angle of our target for uniform radial composition distribution on the disk is found to be about 15-degrees. A model was proposed to explain the observed Tb, Fe and Co content variation with the tilt angle of the target. The dynamic read/write test also showed that good carrier to noise ratio (CNR) was obtained at this angle. A new deposition process for magnetooptical (M-O) disk based on the tilt target method is proposed; it has the merits of enabling simultaneous deposition of multiple disks. The CNR of the disk made at 15-degrees tilt angle is 53 dB.
引用
收藏
页码:426 / 430
页数:5
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