PHOTOELECTRIC STUDY OF ADSORPTION OF RUBIDIUM ON TUNGSTEN

被引：0
|
作者：
HALL, TW [1 ]
MEE, CHB [1 ]
机构：
[1] QUEENS UNIV BELFAST,DEPT PURE & APPL PHYS,BELFAST BT7 1NN,NORTH IRELAND
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1974年
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D O I：
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中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：741 / 744
页数：4
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