DC-GLOW DISCHARGE IN A TUBE WITH THE WALLS OF A DIFFERENT CATALYTIC ACTIVITY

被引：7
|
作者：
MASEK, K
LASKA, L
机构：
来源：
CZECHOSLOVAK JOURNAL OF PHYSICS | 1980年 / 30卷 / 07期
关键词：
D O I：
10.1007/BF01599914
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：805 / 815
页数：11
相关论文
共 50 条
  • [1] QUANTITATIVE-ANALYSIS WITH DC-GLOW AND RF-GLOW DISCHARGE SPECTROMETRY
    PAYLING, R
    JONES, DG
    GOWER, SA
    SURFACE AND INTERFACE ANALYSIS, 1993, 20 (12) : 959 - 966
  • [2] ION NITRIDING OF TITANIUM AND ZIRCONIUM BY A DC-GLOW DISCHARGE METHOD
    LIU, MB
    GRUEN, DM
    KRAUSS, AR
    REIS, AH
    PETERSON, SW
    HIGH TEMPERATURE SCIENCE, 1978, 10 (01): : 53 - 65
  • [3] Interpretation of depth profiles obtained by DC-glow discharge sputtering
    Cermak, J
    Stloukal, I
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1996, 158 (02): : 397 - 404
  • [4] Cluster model of DC-glow discharge enhanced diamond nucleation
    Wolfson Dept. of Chem. Engineering, Technion - Israel Inst. of Technol., Technion City, Haifa 32000, Israel
    不详
    J Cryst Growth, pt 2 (951-956):
  • [5] Cluster model of DC-glow discharge enhanced diamond nucleation
    Efremenko, I
    Sheintuch, M
    Gouzman, I
    Hoffman, A
    JOURNAL OF CRYSTAL GROWTH, 1999, 198 : 951 - 956
  • [6] AN INVESTIGATION OF MICROCRYSTALLINE FILMS PRODUCED BY A DC-GLOW DISCHARGE IN SILANE AND HYDROGEN
    CARLSON, DE
    SMITH, RW
    JOURNAL OF ELECTRONIC MATERIALS, 1982, 11 (04) : 749 - 760
  • [7] Electron energy distribution function in a cathode fall region of DC-glow discharge
    Elakshar, FF
    Hassouba, MA
    Garamoon, AA
    ICPP 96 CONTRIBUTED PAPERS - PROCEEDINGS OF THE 1996 INTERNATIONAL CONFERENCE ON PLASMA PHYSICS, VOLS 1 AND 2, 1997, : 678 - 681
  • [8] Effect of the magnetic field on the plasma parameters in the cathode fall region of the DC-glow discharge
    Hassouba, MA
    EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2001, 14 (02): : 131 - 135
  • [9] Characteristics of a pulsed DC-glow discharge CVD reactor for deposition of thick diamond films
    Hartmann, P
    Haubner, R
    Lux, B
    INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS, 1998, 16 (03): : 207 - 216
  • [10] Chemical stability of nano-diamond films deposited by the dc-glow discharge process
    Gouzman, I
    Hoffman, A
    DIAMOND AND RELATED MATERIALS, 2000, 9 (3-6) : 378 - 383
12345