AUGER-ELECTRON SPECTROSCOPY OF DEPOSITED SILANE LAYERS

被引：24
|
作者：
CAIN, JF
SACHER, E
机构：
[1] IBM CORP,MAT & ENGN ANAL,POB 6,ENDICOTT,NY 13760
[2] IBM CORP,FAILURE ANAL & ENVIRONM TEST,ENDICOTT,NY 13760
来源：
JOURNAL OF COLLOID AND INTERFACE SCIENCE | 1978年 / 67卷 / 03期
关键词：
D O I：
10.1016/0021-9797(78)90244-8
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：538 / 540
页数：3
相关论文
共 50 条
  • [1] AUGER-ELECTRON SPECTROSCOPY OF CONTRAST FORMING LAYERS ON METALS
    HOFMANN, S
    EXNER, HE
    ZEITSCHRIFT FUR METALLKUNDE, 1974, 65 (12): : 778 - 781
  • [2] THICKNESS MEASUREMENTS OF ADSORBED LAYERS BY AUGER-ELECTRON SPECTROSCOPY
    MARGONINSKI, Y
    SOLID STATE COMMUNICATIONS, 1975, 17 (03) : 373 - 375
  • [3] AUGER-ELECTRON SPECTROSCOPY
    LINSMEIER, C
    VACUUM, 1994, 45 (6-7) : 673 - 690
  • [4] AUGER-ELECTRON SPECTROSCOPY
    KAWAI, T
    DENKI KAGAKU, 1986, 54 (12): : 993 - 995
  • [5] AUGER-ELECTRON SPECTROSCOPY
    BURGGRAF, C
    CARRIERE, B
    GOLDSZTAUB, S
    REVUE DE PHYSIQUE APPLIQUEE, 1976, 11 (01): : 13 - 21
  • [6] AUGER-ELECTRON SPECTROSCOPY
    RIVIERE, JC
    CONTEMPORARY PHYSICS, 1973, 14 (06) : 513 - 539
  • [7] AUGER-ELECTRON SPECTROSCOPY
    PALMBERG, PW
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1975, 20 (03): : 309 - 309
  • [8] AUGER-ELECTRON SPECTROSCOPY OF ADSORBED LAYERS - QUANTITATIVE-ANALYSIS
    GOLDSTEIN, Y
    MILLO, O
    MANY, A
    VACUUM, 1990, 41 (7-9) : 1595 - 1597
  • [9] QUANTITATIVE-ANALYSIS OF ADSORBED LAYERS BY AUGER-ELECTRON SPECTROSCOPY
    MILLO, O
    MANY, A
    GOLDSTEIN, Y
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (04): : 2688 - 2694
  • [10] LEED AND AUGER-ELECTRON SPECTROSCOPY
    HAYAKAWA, K
    JOURNAL OF JAPAN SOCIETY OF LUBRICATION ENGINEERS, 1974, 19 (03): : 237 - 242
12345