THE DISSOCIATIVE ADSORPTION OF AMMONIA ON SI(100)

被引:0
|
作者
TAYLOR, PA [1 ]
WALLACE, RM [1 ]
CHOYKE, WJ [1 ]
DRESSER, MJ [1 ]
YATES, JT [1 ]
机构
[1] UNIV PITTSBURGH,DEPT CHEM,CTR SURFACE SCI,PITTSBURGH,PA 15260
关键词
D O I
暂无
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:L286 / L292
页数:7
相关论文
共 50 条
  • [1] Dissociative adsorption of silane on the Si(100)-(2 × 1) surface
    Dept. of Chemistry and Biochemistry, University of Delaware, Newark, DE 19716, United States
    不详
    J Chem Phys, 5 (2643-2651):
  • [2] Dissociative adsorption of methylsilane on the Si(100)-2 x 1 surface
    Qu, YQ
    Li, J
    Han, KL
    JOURNAL OF PHYSICAL CHEMISTRY B, 2004, 108 (39): : 15103 - 15109
  • [3] Nitrogen Adsorption of Si(100) Surface by Plasma Excited Ammonia
    Pansila, P. Pungboon
    Kanomata, Kensaku
    Ahmmad, Bashir
    Kubota, Shigeru
    Hirose, Fumihiko
    IEICE TRANSACTIONS ON ELECTRONICS, 2015, E98C (05): : 395 - 401
  • [4] ADSORPTION OF AMMONIA ON SI(100), (111) SURFACES - A THEORETICAL APPROACH
    ZHOU, RH
    CAO, PL
    FU, SB
    SURFACE SCIENCE, 1991, 249 (1-3) : 129 - 137
  • [5] Kinetics of dissociative adsorption of dichlorosilane on Si(100)2x1
    Sakamoto, H
    Takakuwa, Y
    Hori, T
    Horie, T
    Suemitsu, M
    Miyamoto, N
    APPLIED SURFACE SCIENCE, 1996, 107 (107) : 68 - 74
  • [6] Dissociative adsorption of silane on the Si(100)-(2x1) surface
    Brown, AR
    Doren, DJ
    JOURNAL OF CHEMICAL PHYSICS, 1999, 110 (05): : 2643 - 2651
  • [7] Dissociative adsorption of H2 on Si(100) induced by atomic H
    Biedermann, A
    Knoesel, E
    Hu, Z
    Heinz, TF
    PHYSICAL REVIEW LETTERS, 1999, 83 (09) : 1810 - 1813
  • [8] The dissociative adsorption of silane and disilane on Si(100)-(2x1)
    Shi, J.
    Tok, E. S.
    Kang, H. Chuan
    JOURNAL OF CHEMICAL PHYSICS, 2007, 127 (16):
  • [9] DYNAMICS OF THE DISSOCIATIVE ADSORPTION OF DISILANE ON SI(100) - ENERGY SCALING AND THE EFFECT OF CORRUGATION
    ENGSTROM, JR
    HANSEN, DA
    FURJANIC, MJ
    XIA, LQ
    JOURNAL OF CHEMICAL PHYSICS, 1993, 99 (05): : 4051 - 4054
  • [10] Multiscale analysis for dissociative adsorption of SiH4 on Si(100) surface
    Sakiyama, Y
    Iga, Y
    Yamaguchi, H
    Takagi, S
    Matsumoto, Y
    SURFACE & COATINGS TECHNOLOGY, 2006, 200 (10): : 3385 - 3388