CONTACT RESISTIVITY MEASUREMENT USING 4 CIRCULAR CONTACTS

被引：3
|
作者：
CHUA, SJ
LEE, SH
机构：
[1] Centre for Optoelectronics, Department of Electrical Engineering, National University of Singapore, 0511
来源：
SOLID-STATE ELECTRONICS | 1992年 / 35卷 / 09期
关键词：
D O I：
10.1016/0038-1101(92)90168-C
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In this paper, a simple technique for measuring contact resistivity of metallization is proposed. It makes use of four circular contacts, a structure which is simple to fabricate and requires only two measurement steps to obtain the contact resistivity. This technique is suitable for process monitoring of contact resistivity in large-scale production where simplicity in fabricating the test structure and in measurement is a necessity.
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页码：1331 / 1335
页数：5
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