TEM INSITU INVESTIGATIONS OF THE CRYSTALLIZATION OF A-SI THIN-FILMS

被引：0
|
作者：
REICHE, M
机构：
来源：
INSTITUTE OF PHYSICS CONFERENCE SERIES | 1991年 / 117期
关键词：
D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
The crystallization of a-Si layers deposited on SiO2- or Si3N4 films has been investigated by in situ annealing in an HVEM. The different formation mechanisms of crystallites by a surface-induced crystallization are presented. Interfacial stresses were deduced to be the main reason for nucleation.
引用
收藏
页码：201 / 204
页数：4
相关论文
共 50 条
  • [1] TEM INSITU INVESTIGATIONS OF THE CRYSTALLIZATION BEHAVIOR OF AMORPHOUS-SILICON THIN-FILMS
    REICHE, M
    HOPFE, S
    ULTRAMICROSCOPY, 1990, 33 (01) : 41 - 50
  • [2] LASER-INDUCED CRYSTALLIZATION OF A-SI - H THIN-FILMS
    HAJTO, J
    GAZSO, J
    ZENTAI, G
    SOMOGYI, IK
    JOURNAL DE PHYSIQUE LETTRES, 1982, 43 (03): : L97 - L102
  • [3] METAL-INDUCED CRYSTALLIZATION OF RF SPUTTERED A-SI THIN-FILMS
    GREENE, JE
    MEI, L
    THIN SOLID FILMS, 1976, 34 (01) : 27 - 30
  • [4] INSITU OPTICAL CHARACTERIZATIONS FOR RF PLASMA DEPOSITED A-SI - H THIN-FILMS
    CANILLAS, A
    BERTRAN, E
    ANDUJAR, JL
    MORENZA, JL
    VACUUM, 1989, 39 (7-8) : 785 - 787
  • [5] High Temperature Crystallization Process of a-Si Thin-films on Aluminum Nitride Substrates
    Muhammad Fahad Bhopal
    Doowon Lee
    Atteq ur Rehman
    Soo Hong Lee
    Silicon, 2018, 10 : 171 - 175
  • [6] High Temperature Crystallization Process of a-Si Thin-films on Aluminum Nitride Substrates
    Bhopal, Muhammad Fahad
    Lee, Doowon
    ur Rehman, Atteq
    Lee, Soo Hong
    SILICON, 2018, 10 (02) : 171 - 175
  • [7] Theoretical models of fast crystallization of a-Si thin films
    Chvoj, Z
    Chab, V
    Borusik, O
    THERMOCHIMICA ACTA, 1996, 280 : 261 - 277
  • [8] An optical study of Ni induced crystallization of a-Si thin films
    Kumar, Koppolu Uma Mahendra
    Brahma, Rajeeb
    Krishna, M. Ghanashyam
    Bhatnagar, Anil K.
    Dalba, G.
    JOURNAL OF PHYSICS-CONDENSED MATTER, 2007, 19 (49)
  • [9] Inhomogeneous crystallization of a-Si thin films irradiated by femtosecond laser
    Li, Dongyang
    Ilyas, Nasir
    Song, Yuhao
    Zhong, Hao
    Li, Wei
    Jiang, Yadong
    JOURNAL OF RAMAN SPECTROSCOPY, 2019, 50 (06) : 793 - 801
  • [10] Deposition and crystallization of a-Si thin films by rapid thermal processing
    Girginoudi, S
    Girginoudi, D
    Georgoulas, N
    Thanailakis, A
    RAPID THERMAL PROCESSING, 1999, 84 : 287 - 292
12345