OPTICAL-PROPERTIES OF EPITAXIAL COSI2 AND NISI2 FILMS ON SILICON

被引：29
|
作者：
JIMENEZ, JR
WU, ZC
SCHOWALTER, LJ
HUNT, BD
FATHAUER, RW
GRUNTHANER, PJ
LIN, TL
机构：
[1] RENSSELAER POLYTECH INST,CTR INTEGRATED ELECTR,TROY,NY 12180
[2] GE,CTR CORP RES & DEV,SCHENECTADY,NY 12301
[3] CALTECH,JET PROP LAB,PASADENA,CA 91109
来源：
JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 06期
关键词：
D O I：
10.1063/1.344217
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：2738 / 2741
页数：4
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