CHANNELING OF FISSION FRAGMENTS IN SILICON

被引：0
|
作者：
DEMICHELIS, F [1 ]
LISCIA, R [1 ]
TARTAGLIA, A [1 ]
机构：
[1] POLITECN TORINO, IST FIS SPERIMENTALE, TURIN, ITALY
来源：
LETTERE AL NUOVO CIMENTO | 1972年 / 5卷 / 14期
关键词：
D O I：
10.1007/BF02777990
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：918 / 920
页数：3
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