THE FORMATION OF SIO2 IN AN RF GENERATED OXYGEN PLASMA .1. THE PRESSURE RANGE BELOW 10 MTORR

被引：45
|
作者：
RAY, AK
REISMAN, A
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1981年 / 128卷 / 11期
关键词：
D O I：
10.1149/1.2127270
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：2460 / 2465
页数：6
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