A FLUID DESCRIPTION FOR THE DISCHARGE EQUILIBRIUM OF A DIVERGENT ELECTRON-CYCLOTRON RESONANCE PLASMA SOURCE

被引:12
|
作者
GUAN, G [1 ]
MAUEL, ME [1 ]
HOLBER, WM [1 ]
CAUGHMAN, JBO [1 ]
机构
[1] IBM CORP,DIV RES,TJ WATSON RES CTR,YORKTOWN HTS,NY 10598
来源
PHYSICS OF FLUIDS B-PLASMA PHYSICS | 1992年 / 4卷 / 12期
关键词
D O I
10.1063/1.860324
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A fluid description of the presheath of a magnetized plasma is used to model a divergent electron cyclotron resonance (ECR) plasma source. The fluid equations are moments of the time-independent Boltzman equation when cross-field particle motion occurs only through a static E X B drift. Closure is obtained by neglecting third-order moments. The electrons are assumed to have constant temperature along the magnetic field, to obey a Maxwell-Boltzmann potential-density relationship, and to be warmer than the ions. Interactions between plasma and neutral gas are included by specifying the profile of the gas density along the magnetic field and collision cross sections. A form of the equations is derived that can be used to study ions with anisotropic temperatures. The model is used to estimate the axial profiles of the density, ion flow, and ion temperature of an ECR plasma source. The calculated global relationships between (1) the electron temperature and the equilibrium neutral gas density, and (2) the absorbed microwave power and the equilibrium plasma density are comparable with experimental measurements. Furthermore, the calculated ion temperature is comparable to recently reported measurements [Appl. Phys. Lett. 57, 661 (1990) and Appl. Phys. Lett. 58, 458 (1991)].
引用
收藏
页码:4177 / 4186
页数:10
相关论文
共 50 条
  • [1] PLASMA CHARACTERIZATION FOR A DIVERGENT FIELD ELECTRON-CYCLOTRON RESONANCE SOURCE
    FORSTER, J
    HOLBER, W
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 899 - 902
  • [2] AN ELECTRON-CYCLOTRON RESONANCE PLASMA SOURCE
    LORENZ, G
    BAUMANN, P
    CASTRISCHER, G
    KESSLER, I
    KRETSCHMER, KH
    DUMBACHER, B
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1991, 139 : 302 - 306
  • [3] AN ELECTRON-CYCLOTRON RESONANCE (ECR) PLASMA SOURCE
    KRETSCHMER, KH
    MATL, K
    LORENZ, G
    KESSLER, I
    DUMBACHER, B
    SOLID STATE TECHNOLOGY, 1990, 33 (02) : 53 - 55
  • [4] Multicomponent consideration of electron fraction of electron-cyclotron resonance source plasma
    Shirkov, G
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2000, 71 (02): : 850 - 852
  • [5] ELONGATED MICROWAVE ELECTRON-CYCLOTRON RESONANCE HEATING PLASMA SOURCE
    GEISLER, M
    KIESER, J
    RAUCHLE, E
    WILHELM, R
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (02): : 908 - 915
  • [6] POTENTIAL APPLICATIONS OF AN ELECTRON-CYCLOTRON RESONANCE MULTICUSP PLASMA SOURCE
    TSAI, CC
    BERRY, LA
    GORBATKIN, SM
    HASELTON, HH
    ROBERTO, JB
    STIRLING, WL
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03): : 2900 - 2903
  • [7] ELECTRON-CYCLOTRON RESONANCE SOURCE FOR CYCLONE
    JONGEN, Y
    PIRART, C
    RYCKEWAERT, G
    STEYAERT, J
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1979, 26 (02) : 2160 - 2163
  • [8] ION ENERGY-DISTRIBUTIONS AT THE ELECTRON-CYCLOTRON RESONANCE POSITION IN ELECTRON-CYCLOTRON RESONANCE PLASMA
    SAMUKAWA, S
    NAKAGAWA, Y
    IKEDA, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1990, 29 (12): : L2319 - L2321
  • [9] MODELING OF PLASMA-FLOW DOWNSTREAM OF AN ELECTRON-CYCLOTRON RESONANCE PLASMA SOURCE
    HUSSEIN, MA
    EMMERT, GA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03): : 2913 - 2918
  • [10] ION-SOURCE WITH PLASMA GENERATION BY MICROWAVES IN ELECTRON-CYCLOTRON RESONANCE
    HAMMER, K
    WEISSMANTEL, C
    ANNALEN DER PHYSIK, 1985, 42 (4-6) : 432 - 444