HIGH HEAT LOAD X-RAY OPTICS RESEARCH-AND-DEVELOPMENT AT THE ADVANCED-PHOTON-SOURCE - AN OVERVIEW

被引:3
|
作者
LEE, WK
MILLS, DM
机构
[1] Advanced Photon Source, Argonne National Laboratory, Argonne, IL 60439
关键词
D O I
10.1016/0168-9002(94)91960-7
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Insertion devices at third-generation synchrotron radiation sources are capable of producting X-ray beams with total power in excess of 7 kW or power densities of 150 W/mm2 at a typical location of the optical components. Optical elements subjected to these heat fluxes will suffer considerably unless carefully designed to withstand such unprecedented power loadings. At the Advanced Photon Source (APS), we have an aggressive program aimed at investigating possible methods to mitigate thermal distortions. The approaches being studied include improved heat exchangers, use of liquid gallium and liquid nitrogen as coolants, novel crystal geometries, power filtering, and replacement of silicon with diamond for crystal monochromators. This paper provides an overview of the high heat load X-ray optics program at the APS.
引用
收藏
页码:618 / 626
页数:9
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