CRITICAL RESISTIVITY OF ANTIFERROMAGNETIC SEMICONDUCTORS

被引：8

作者：

BALBERG, I

ALEXANDER, S

HELMAN, JS

机构：

[1] HEBREW UNIV, RACAH INST PHYS, JERUSALEM, ISRAEL

[2] INST POLITECNICO NAC, CTR INVEST, DEPT FIS, MEXICO CITY 14, MEXICO

来源：

PHYSICAL REVIEW LETTERS | 1974年 / 33卷 / 14期

关键词：

D O I：

10.1103/PhysRevLett.33.836

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：836 / 839

页数：4

共 21 条

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