SUBSURFACE ATOMIC DISPLACEMENTS AT GAAS(110) SURFACE

被引：58

作者：

KAHN, A ^{[1
]}

SO, E ^{[1
]}

MARK, P ^{[1
]}

DUKE, CB ^{[1
]}

机构：

[1] XEROX CORP,WEBSTER RES CTR,ROCHESTER,NY 14644

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 02期

关键词：

D O I：

10.1116/1.569630

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：580 / 584

页数：5

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