MAGNETIC-PROPERTIES OF FE-TA-(B)-N FILMS

被引:7
|
作者
NAGO, K
SAKAKIMA, H
IHARA, K
OSANO, K
机构
[1] Magnetic Devices Research Lab., Matsushita Electric Ind. Co., Ltd., Moriguchi, Osaka
关键词
Boron - Crystal growth - Iron - Magnetic fields - Magnetic properties - Nitrogen - Sputtering - Tantalum;
D O I
10.1109/20.179680
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In-plane magnetic anisotropy and thickness dependence of soft magnetic properties for Fe-Ta-N films near the eutectic composition, annealed either in a rotating magnetic field, in a static field or with no magnetic field were investigated in detail. The soft magnetic films were prepared by r.f. reactive sputtering. The films with thicknesses greater than around 2-mu-m have good soft magnetic properties. For those with thicknesses less than around 1-mu-m, the soft magnetic properties deteriorate and the domain structure changes with decreasing thickness. The films annealed without magnetic field or in a rotating field have an isotropic high permeability (mu' greater-than-or-equal-to 5000 at 1 MHz) and a low anisotropy field (H(K) congruent-to 50 A/m), whereas for the films annealed in a static field, uniaxial anisotropy is induced. This anisotropy increases with increasing N concentration. Moreover, B was added to Fe-Ta-N system, and the relation between the structures and soft magnetic properties of Fe-Ta-B-N films was investigated. By adding B to Fe-Ta-N system, the thermal stability of soft magnetic properties is improved, because the growth of alpha-Fe and Ta-(N, B) grains is suppressed during annealing at higher temperatures.
引用
收藏
页码:2943 / 2945
页数:3
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