PRODUCTION AND DEMONSTRATION OF ATOMICALLY CLEAN METAL SURFACES

被引：69
作者：
HAGSTRUM, HD
DAMICO, C
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1960年 / 31卷 / 04期
关键词：
D O I：
10.1063/1.1735674
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：715 / 723
页数：9
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