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- [2] COMBINED INSTRUMENT FOR THE ONLINE INVESTIGATION OF PLASMA-DEPOSITED OR ETCHED SURFACES BY MONOCHROMATIZED X-RAY PHOTOELECTRON-SPECTROSCOPY AND TIME-OF-FLIGHT SECONDARY-ION MASS-SPECTROMETRY JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (03): : 671 - 676
- [3] SECONDARY-ION MASS-SPECTROMETRY TIME-OF-FLIGHT AND IN-SITU X-RAY PHOTOELECTRON-SPECTROSCOPY STUDIES OF POLYMER SURFACE MODIFICATIONS BY A REMOTE OXYGEN PLASMA TREATMENT JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (04): : 2491 - 2498
- [4] ANALYSIS OF STOICHIOMETRY AND OXIDE-GROWTH OF HF TREATED GAAS(100) BY X-RAY PHOTOELECTRON-SPECTROSCOPY AND TIME-OF-FLIGHT SECONDARY-ION MASS-SPECTROMETRY JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (01): : 147 - 153