NATURE OF THE BARRIER OXIDE-FILMS FORMED ON HAFNIUM ELECTRODE

被引：26

作者：

ELBASIOUNY, MS ^{[1
]}

ELKOT, AM ^{[1
]}

HEFNY, MM ^{[1
]}

机构：

[1] ZAGAZIG UNIV,FAC SCI,DEPT CHEM,ZAGAZIG,EGYPT

来源：

CORROSION | 1980年 / 36卷 / 06期

关键词：

D O I：

10.5006/0010-9312-36.6.284

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：284 / 288

页数：5

共 50 条

[1] CONDUCTIVITY OF OXIDE-FILMS FORMED BY HIGH-TEMPERATURE OXIDATION ON ZIRCONIUM AND HAFNIUM
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[3] NATURE AND CORRODABILITY OF THIN OXIDE-FILMS FORMED ON NIOBIUM IN NAOH SOLUTIONS
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[4] NATURE AND STABILITY OF ANODIC OXIDE-FILMS FORMED ON MOLYBDENUM IN CHLORIDE SOLUTIONS
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[5] GALVANOSTATIC REDUCTION OF OXIDE-FILMS FORMED ON CADMIUM ELECTRODE IN ALKALINE-SOLUTIONS
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[6] CHARACTERIZATION OF HAFNIUM OXIDE-FILMS MODIFIED BY PT DOPING
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[7] CRYSTALLINE BARRIER OXIDE-FILMS ON ALUMINUM
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[8] AN EIS STUDY OF ALUMINUM BARRIER-TYPE OXIDE-FILMS FORMED IN DIFFERENT MEDIA
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[9] COMPOSITION OF BARRIER TYPE OXIDE-FILMS ANODICALLY FORMED ON ALUMINUM IN A NEUTRAL BORATE SOLUTION
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[10] INFLUENCE OF THE NATURE OF ALLOYING ELEMENTS ON THE ADHERENCE OF OXIDE-FILMS FORMED ON TITANIUM-ALLOYS
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