ADSORPTION OF METAL-IONS ON A NOVEL AMINE-TYPE CHELATING RESIN

被引:10
|
作者
INOUE, K
YOSHIZUKA, K
BABA, Y
机构
[1] Department of Applied Chemistry, Saga University, Honjo-machi, Saga
关键词
D O I
10.1080/07366299.1990.11073615
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Distribution equilibria were investigated for the adsorption of metal ions and acids on Sumi-chelate MC-10 resin, a polyethylene polyamine type of novel chelating resin. The total exchange capacities for HC1 and HNO3 were evaluated as 5.6 and 6.3 mol/kg dry resin, respectively. Adsorption of various divalent transition metals and precious metals was investigated from HC1 on the chloride form of the resin. The adsorption of transition metals took place in the sequence Cd >Zn>Cu>Co>Mn. The adsorption of Pt(IV) was only slightly selective over Pd(II); however, the latter was selectively eluted with high concentrations of HCl. Adsorption of Ag(I), Zn(II) and Cu (II) was investigated from 1 mol/dm3 NH4NO3 on the free base form of the resin. It took place in the sequence Cu>Ag>Zn. The mechanism of the adsorption of metal ions mentioned above was qualitatively discussed. © 1990, Taylor & Francis Group, LLC. All rights reserved.
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页码:309 / 323
页数:15
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