ANNEALING OF SELF-INTERSTITIALS IN GERMANIUM

被引：1
|
作者：
FUKUOKA, N [1 ]
SAITO, H [1 ]
YOSHIDA, H [1 ]
机构：
[1] KYOTO UNIV,INST RES REACTOR,OSAKA 59004,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1981年 / 20卷 / 07期
关键词：
D O I：
10.1143/JJAP.20.L481
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：L481 / L484
页数：4
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