Contacts between metals and between a metal and a semiconductor

被引：32

作者：

Fan, HY ^{[1
]}

机构：

[1] Natl Tsing Hua Univ, Radio Res Inst, Kunming, Peoples R China

来源：

PHYSICAL REVIEW | 1942年 / 62卷 / 7/8期

关键词：

D O I：

10.1103/PhysRev.62.388

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：388 / 394

页数：7

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