IN-SITU QUANTITATIVE SOFT-X-RAY SPECTROMETRY OF THIN-FILMS SYNTHESIZED BY DC SPUTTERING

被引：0
|
作者：
LEGRAND, PB [1 ]
DAUCHOT, JP [1 ]
WAUTELET, M [1 ]
HECQ, M [1 ]
机构：
[1] UNIV MONS HAINAULT,CHIM INORGAN & ANALYT LAB,B-7000 MONS,BELGIUM
来源：
SURFACE AND INTERFACE ANALYSIS | 1994年 / 22卷 / 1-12期
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D O I：
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中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Spectrometry of the soft x-rays emitted by the growing film or its substrate during sputtering is used to monitor the film synthesis: determination of native oxide on the substrates, film stoichiometry versus experimental conditions, control of oxygen content during nitride synthesis, etc. Quantitative data can be obtained by using a simple exponential profile for the ionization function.
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页码：174 / 174
页数：1
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