SECONDARY-ELECTRON IMAGING OF DISORDERED SUBMONOLAYERS

被引:8
|
作者
WETLI, E
ERBUDAK, M
VVEDENSKY, DD
机构
[1] ETH ZURICH,FESTKORPERPHYS LAB,CH-8093 ZURICH,SWITZERLAND
[2] UNIV LONDON IMPERIAL COLL SCI TECHNOL & MED,BLACKETT LAB,LONDON SW7 2BZ,ENGLAND
[3] ETH ZURICH,INST ANGEW PHYS,CH-8093 ZURICH,SWITZERLAND
关键词
D O I
10.1016/0039-6028(94)90270-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Secondary-electron imaging (SEI), which allows real-time imaging of near-surface structures in real space, is applied to a (111) surface of an Al-3at%Ag alloy. In the fully segregated state, the Ag surface concentration is 0.3 monolayers. Although there is no long-range order, as evidenced by the absence of a low-energy electron-diffraction pattern, an analysis of the SEI image shows that a significant fraction of Ag atoms occupy three-fold symmetric hollow sites in stacking-fault positions. SEI is shown to be a useful new technique for structural studies of evolving surfaces even with submonolayer coverages, such as growing films with short-range order.
引用
收藏
页码:235 / 240
页数:6
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