GAS SURFACE-REACTIONS IN THE CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN USING WF6/SIH4 MIXTURES

被引：46
|
作者：
YU, ML
ELDRIDGE, BN
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期
关键词：
D O I：
10.1116/1.575855
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：625 / 629
页数：5
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