ENGINEERING OF PLASMA DEPOSITION SYSTEMS USED FOR PRODUCING LARGE AREA A-SI-H DEVICES

被引：11
|
作者：
MARTINS, R
FERREIRA, I
CARVALHO, N
GUIMARAES, L
机构：
[1] Faculty of Science and Technology, New University of Lisbon, Department of Materials Science, 2825 Monte da Caparica, Quinta da Torre
来源：
JOURNAL OF NON-CRYSTALLINE SOLIDS | 1991年 / 137卷
关键词：
D O I：
10.1016/S0022-3093(05)80231-5
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
One of the main problems in producing large area amorphous silicon devices concerns films uniformity. In this paper we present data concerning the role of reactor geometry and design and on the film performances as well as the problems related to mechanical mismatches in scaling up the reactor size.
引用
收藏
页码：757 / 760
页数：4
相关论文
共 50 条
  • [1] ENGINEERING OF THE ENERGY COUPLING IN PECVD SYSTEMS USED TO PRODUCE LARGE-AREA A-SI-H COATINGS
    MARTINS, R
    FERREIRA, I
    VACUUM, 1994, 45 (10-11) : 1107 - 1108
  • [2] KINETICS OF PLASMA DEPOSITION OF A-SI-H FILMS
    HOTTA, S
    OKAMOTO, H
    HAMAKAWA, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (09): : L562 - L564
  • [3] PLASMA CLEANING IN AN A-SI-H DEPOSITION CHAMBER
    PRIMIG, R
    ROSAN, K
    VACUUM, 1986, 36 (1-3) : 75 - 80
  • [4] DEPOSITION OF A-SI-H FILMS WITH A REMOTE HYDROGEN PLASMA
    JOHNSON, NM
    WALKER, J
    DOLAND, CM
    WINER, K
    STREET, RA
    AMORPHOUS SILICON TECHNOLOGY - 1989, 1989, 149 : 39 - 43
  • [5] PLASMA SPECTROSCOPY - CONTROL AND ANALYSIS OF A-SI-H DEPOSITION
    MATSUDA, A
    NAKAGAWA, K
    TANAKA, K
    MATSUMURA, M
    YAMASAKI, S
    OKUSHI, H
    IIZIMA, S
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1980, 35-6 (JAN-) : 183 - 188
  • [6] CONTROL OF A-SI-H DEPOSITION BY THE ION FLUX IN A VHF PLASMA
    HEINTZE, M
    ZEDLITZ, R
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1993, 164 : 55 - 58
  • [7] PLASMA AND SURFACE-REACTIONS IN A-SI-H DEPOSITION DISCHARGES
    GALLAGHER, A
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1991, 201 : 242 - PHYS
  • [8] ORIGIN OF EMITTING SPECIES IN THE PLASMA DEPOSITION OF A-SI-H ALLOYS
    KAMPAS, FJ
    GRIFFITH, RW
    JOURNAL OF APPLIED PHYSICS, 1981, 52 (03) : 1285 - 1288
  • [9] HIGHLY UNIFORM LARGE-AREA A-SI-H FILMS
    SANEMATSU, MS
    PEREYRA, I
    ANDRADE, AM
    MARTINS, RFP
    SOLAR CELLS, 1985, 14 (03): : 281 - 287
  • [10] ELECTRODE GEOMETRY INFLUENCE UPON A-SI-H DEPOSITION BY PLASMA CVD
    BICKLER, DB
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (08) : C305 - C305
12345