共 13 条
- [2] KINETICS AND MECHANISM OF THE ELECTROCHEMICAL FORMATION OF POROUS SURFACE-LAYERS ON SILICON IN HYDROFLUORIC-ACID - SPECIFIC KINETIC FEATURES OF POROUS-LAYER FORMATION ON N-TYPE AND P-TYPE SILICON SOVIET ELECTROCHEMISTRY, 1986, 22 (12): : 1494 - 1500
- [3] EFFECT OF HYDROFLUORIC-ACID CONCENTRATION ON THE STRUCTURE AND KINETICS OF ELECTROCHEMICAL FORMATION OF THE POROUS LAYER ON N-TYPE SILICON UNDER STEADY ILLUMINATION SOVIET ELECTROCHEMISTRY, 1987, 23 (11): : 1445 - 1452
- [4] Anomalously high photovoltaic activity of polished n-type silicon during anodic porous layer formation in hydrofluoric-acid solutions Soviet electrochemistry, 1988, 23 (11): : 1452 - 1457
- [5] ANOMALOUSLY HIGH PHOTOVOLTAIC ACTIVITY OF POLISHED N-TYPE SILICON DURING ANODIC POROUS-LAYER FORMATION IN HYDROFLUORIC-ACID SOLUTIONS SOVIET ELECTROCHEMISTRY, 1987, 23 (11): : 1452 - 1457
- [6] KINETICS AND MECHANISM OF THE ELECTROCHEMICAL FORMATION OF POROUS SURFACE LAYERS ON SILICON IN HYDROFLUORIC ACID. PHOTOELECTROCHEMICAL BEHAVIOR OF n-TYPE SILICON DURING ANODIC FORMATION OF THE POROUS LAYERS. Soviet electrochemistry, 1986, 23 (03): : 313 - 319
- [8] THE KINETICS AND MECHANISM OF THE ELECTROCHEMICAL FORMATION OF POROUS SURFACE-LAYERS ON SILICON IN HYDROFLUORIC-ACID - PHOTOELECTROCHEMICAL BEHAVIOR OF NORMAL-TYPE SILICON DURING ANODIC FORMATION OF THE POROUS LAYERS SOVIET ELECTROCHEMISTRY, 1986, 22 (03): : 313 - 319
- [9] Effect of hydrofluoric acid concentration on the structure and kinetics of electrochemical formation of the porous layer on n-type silicon under steady illumination Soviet electrochemistry, 1988, 23 (11): : 1445 - 1452