DEPOSITION AND THERMAL-STABILITY OF A MG THIN-FILM ON CVD AL2O3

被引：0
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作者：
ZHOU, ZQ [1 ]
BURNS, RP [1 ]
机构：
[1] UNIV ILLINOIS,DEPT CHEM,CHICAGO,IL 60607
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1993年 / 206卷
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
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页码：5 / IEC
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