DEPTH PROFILING IN SURFACES USING TOTAL-REFLECTION X-RAY-FLUORESCENCE

被引:13
|
作者
SCHWENKE, H
KNOTH, J
机构
[1] GKSS-Forschungszentrum
关键词
GLANCING INCIDENCE X-RAY FLUORESCENCE SPECTROSCOPY; CALIBRATION; THIN FILM ANALYSIS; SURFACE ANALYSIS; DEPTH PROFILING;
D O I
10.2116/analsci.11.533
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Only three types of specimens can be applied for calibration in TXRF, namely pure particle-, film- or bulk-type samples. In this study ''droplet'' standards, as a representative of the particle type, and ''spin-drying'' standards, for film-type samples were examined and compared with a pure metal standard (bulk-type). A test procedure is described which makes it possible to detect faulty calibration samples. An iterative data processing technique is presented which extracts layer characteristics and-to a certain extent-depth profiles from TXRF data as a function of the incident angle. Two selected examples are considered, a Fe-Ti-Fe thin-layer system and an implantation profile of Ni-atoms in silicon. Based on these samples, the capability and limitations of TXRF for depth profiling are discussed.
引用
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页码:533 / 537
页数:5
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