CHARACTERISTICS OF MICROWAVE PLASMA AND PREPARATION OF A-SI THIN-FILM

被引：13
|
作者：
FUJITA, H
HANDA, H
NAGANO, M
MATSUO, H
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1987年 / 26卷 / 07期
关键词：
D O I：
10.1143/JJAP.26.1112
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1112 / 1116
页数：5
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