HIGH-TEMPERATURE FILM FORMATION ON COBALT-HARDENED GOLD

被引：11

作者：

THOMAS, JH ^{[1
]}

SHARMA, SP ^{[1
]}

机构：

[1] BELL TEL LABS INC,COLUMBUS,OH 43210

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1979年 / 126卷 / 03期

关键词：

D O I：

10.1149/1.2129060

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：445 / 449

页数：5

共 50 条

[1] IMPURITIES IN COBALT-HARDENED GOLD ELECTRODEPOSITS
COHEN, RL
WEST, KW
ANTLER, M
BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1976, 21 (04): : 565 - 566
[2] POLYMER INCLUSIONS IN COBALT-HARDENED ELECTROPLATED GOLD
OKINAKA, Y
KOCH, FB
WOLOWODIUK, C
BLESSINGTON, DR
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (11) : 1745 - 1750
[3] POLYMER INCLUSIONS IN COBALT-HARDENED ELECTROPLATED GOLD
OKINAKA, Y
KOCH, FB
WOLOWODIUK, C
BLESSINGTON, DR
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (08) : C348 - C348
[4] CHEMICAL-STATE OF COBALT IN COBALT-HARDENED GOLD ELECTRODEPOSITS
LEIDHEISER, H
VERTES, A
VARSANYI, ML
CZAKONAGY, I
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (03) : 391 - 394
[5] SEARCH FOR GOLD CYANIDE INCLUSIONS IN COBALT-HARDENED GOLD ELECTRODEPOSITS
COHEN, RL
WEST, KW
ANTLER, M
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (03) : 342 - 345
[6] DIRECT OBSERVATION OF INCLUSIONS IN COBALT-HARDENED GOLD ELECTRODEPOSITS
NAKAHARA, S
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (02) : 451 - 456
[7] STRUCTURE AND HARDNESS CHARACTERISTICS OF HIGH-SPEED ELECTRODEPOSITED COBALT-HARDENED GOLD
CAMP, EK
THIN SOLID FILMS, 1978, 54 (02) : 160 - 160
[8] EFFECT OF METAL-ION DEPLETION ON COBALT-HARDENED GOLD
NAKAHARA, S
CHESSERI, RJ
PLATING AND SURFACE FINISHING, 1984, 71 (09): : 62 - 69
[9] DIFFUSION OF COBALT OUT OF COBALT-HARDENED GOLD MEASURED WITH AUGER-ELECTRON SPECTROSCOPY
TOMPKINS, HG
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (07) : 983 - 987
[10] COBALT CYANOAURATE - CRYSTAL-STRUCTURE OF A COMPONENT FROM COBALT-HARDENED GOLD ELECTROPLATING BATHS
ABRAHAMS, SC
ZYONTZ, LE
BERNSTEIN, JL
JOURNAL OF CHEMICAL PHYSICS, 1982, 76 (11): : 5458 - 5462

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