EFFECT OF CHEMICAL COMPOSITION UPON THE RADIATION AND ELECTRON-BEAM RESIST BEHAVIORS OF VINYL-POLYMERS

被引：11
|
作者：
HELBERT, JN
IAFRATE, GJ
PITTMAN, CU
LAI, JH
机构：
[1] UNIV ALABAMA,BIRMINGHAM,AL 35233
[2] HONEYWELL INC,CTR MAT SCI,BLOOMINGTON,MN 55420
来源：
POLYMER ENGINEERING AND SCIENCE | 1980年 / 20卷 / 16期
关键词：
D O I：
10.1002/pen.760201608
中图分类号：
TQ [化学工业];
学科分类号：
0817 ;
摘要：
引用
收藏
页码：1077 / 1081
页数：5
相关论文
共 50 条
  • [1] SYNTHESIS, RADIATION DEGRADATION, AND ELECTRON-BEAM RESIST BEHAVIOR OF FLUORINE-CONTAINING VINYL-POLYMERS
    PITTMAN, CU
    UEDA, M
    CHEN, CY
    KWIATKOWSKI, JH
    COOK, CF
    HELBERT, JN
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (08) : 1758 - 1762
  • [2] EFFECT OF HALOGEN SUBSTITUENTS UPON VINYL ELECTRON-BEAM RESIST SENSITIVITY
    HELBERT, JN
    KWIATOWSKI, JH
    COOK, CF
    LAI, JH
    PITTMAN, CU
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (08) : C374 - C374
  • [3] RELATIONSHIP BETWEEN ELECTRON SENSITIVITY AND CHEMICAL STRUCTURES OF POLYMERS AS ELECTRON-BEAM RESIST .7. ELECTRON SENSITIVITY OF VINYL-POLYMERS CONTAINING PENDANT 1,3-DIOXOLAN GROUPS
    OGUCHI, K
    SANUI, K
    OGATA, N
    TAKAHASHI, Y
    NAKADA, T
    POLYMER ENGINEERING AND SCIENCE, 1990, 30 (08): : 449 - 452
  • [4] EFFECT OF COMPOSITION ON RESIST DRY-ETCHING SUSCEPTIBILITY - NOVEL VINYL-POLYMERS
    HELBERT, JN
    SCHMIDT, MA
    MALKIEWICZ, C
    WALLACE, E
    PITTMAN, CU
    ACS SYMPOSIUM SERIES, 1984, 242 : 91 - 100
  • [5] RADIATION-DEGRADATION AND SENSITIVITY STUDIES OF CHLORINE-CONTAINING VINYL-POLYMERS FOR ELECTRON-BEAM RESISTS
    WALLACE, E
    PITTMAN, CU
    KWIATKOWSKI, J
    COOK, CF
    HELBERT, JN
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1983, 185 (MAR): : 27 - POLY
  • [6] EFFECT OF COMPOSITION ON RESIST DRY-ETCHING SUSCEPTIBILITY VINYL-POLYMERS AND PHOTORESISTS
    HELBERT, JN
    SCHMIDT, MA
    ACS SYMPOSIUM SERIES, 1982, 184 : 61 - 72
  • [7] EFFECT OF COMPOSITION ON RESIST DRY-ETCHING SUSCEPTIBILITY .2. NOVEL VINYL-POLYMERS
    HELBERT, JN
    SCHMIDT, MA
    MALKIEWICZ, C
    WALLACE, E
    PITTMAN, CU
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1983, 185 (MAR): : 149 - ORPL
  • [8] PREBAKE EFFECTS IN CHEMICAL AMPLIFICATION ELECTRON-BEAM RESIST
    AZUMA, T
    MASUI, K
    TAKIGAMI, Y
    SASAKI, H
    SAKAI, K
    NOMAKI, T
    KATO, Y
    MORI, I
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (11B): : 3138 - 3141
  • [9] Prebake effects in chemical amplification electron-beam resist
    Azuma, Tsukasa, 1600, (30):
  • [10] RESIST HEATING EFFECT IN ELECTRON-BEAM LITHOGRAPHY
    YASUDA, M
    KAWATA, H
    MURATA, K
    HASHIMOTO, K
    HIRAI, Y
    NOMURA, N
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (03): : 1362 - 1366
12345